This paragraph in particular was especially helpful: "Given the
control parameters for the power source (frequency $v$, driving voltage $V_rf$ , or absorbed power $P_abs$ ),
the feedstock gas (pressure $p$, flow rate $r$, and chemical composition),
and the geometry (simplified here to the discharge length $l$),
then find the plasma parameters, including the plasma density $n_i$ , the etchant density $n_F$ , the ion and etchant fluxes $G_i$ and $G_F$ hitting the substrate, the electron and ion temperatures $T_e$ and $T_i$ , the ion bombarding energy $E_i$ , and the sheath thickness $s$. Th…